Differences in anisotropic etching properties of KOH and TMAH solutions

Anisotropic Etching of Crystalline Silicon in Alkaline Solutions: I . Orientation Dependence and Behavior of Passivation Layers

H. Seidel, L. Csepregi, A. Heuberger et al. · Journal of The Electrochemical Society · 1990 · 1.6K citations

Natural Sciences, Materials Engineering, Materials Science +17

Anisotropic etching of silicon in TMAH solutions

Osamu Tabata, Ryouji Asahi, Hirofumi Funabashi et al. · Sensors and Actuators A Physical · 1992 · 458 citations

Engineering, Materials Engineering, Materials Science +14

Characterization of orientation-dependent etching properties of single-crystal silicon: effects of KOH concentration

Kazuo Sato, Mitsuhiro Shikida, Yoshihiro Matsushima et al. · Sensors and Actuators A Physical · 1998 · 321 citations

Engineering, Materials Engineering, Materials Science +12

Etching roughness for (100) silicon surfaces in aqueous KOH

E. D. Palik, O. J. Glembocki, I. Heard et al. · Journal of Applied Physics · 1991 · 160 citations

Natural Sciences, Materials Engineering, Materials Science +16

TMAHW etchants for silicon micromachining

Uwe Schnakenberg, W. Benecke, Peter J. de Lange · TRANSDUCERS '91: 1991 International Conference on Solid-State Sensors and Actuators. Digest of Technical Papers · 1991 · 109 citations

Engineering, Materials Engineering, Materials Science +17