A three-dimensional MOS transistor formation technique with crystallographic orientation-dependent TMAH etchant

1-V power supply high-speed digital circuit technology with multithreshold-voltage CMOS

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Impact of the vertical SOI 'DELTA' structure on planar device technology

Digh Hisamoto, T. Kaga, Eiji Takeda · IEEE Transactions on Electron Devices · 1991 · 149 citations

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Boosted gate MOS (BGMOS): device/circuit cooperation scheme to achieve leakage-free giga-scale integration

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A corrugated capacitor cell (CCC)

H. Sunami, T. Kure, N. Hashimoto et al. · IEEE Transactions on Electron Devices · 1984 · 58 citations

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A corrugated capacitor cell (CCC) for megabit dynamic MOS memories

H. Sunami, T. Kure, N. Hashimoto et al. · IEEE Electron Device Letters · 1983 · 39 citations

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