Reactive ion etching of diamond and diamond-like carbon films

C 1<i>s</i>excitation studies of diamond (111). I. Surface core levels

J. F. Morar, F. J. Himpsel, G. Hollinger et al. · Physical review. B, Condensed matter · 1986 · 225 citations

Natural Sciences, Materials Science, Physics +15

Plasma deposition of hydrogenated amorphous carbon: growth rates, properties and structures

N. Fourches, G. Turban · Thin Solid Films · 1994 · 80 citations

Natural Sciences, Materials Engineering, Materials Science +13

Diamond deposition in a bell-jar reactor: influence of the plasma and substrate parameters on the microstructure and growth rate

A. Gicquel, E. Anger, M. F. Ravet et al. · Diamond and Related Materials · 1993 · 50 citations

Natural Sciences, Materials Engineering, Materials Science +5

Mechanism of etching and of surface modification of polyimide in RF and LF SF6-O2 discharges

Masuhiro Kogoma, G. Turban · Plasma Chemistry and Plasma Processing · 1986 · 41 citations

Natural Sciences, Materials Engineering, Materials Science +14

A Kinetic Study of Reactive Ion Etching of Tungsten in  SF 6 /  O 2 RF Plasmas

M. C. Peignon, Christophe Cardinaud, G. Turban · Journal of The Electrochemical Society · 1993 · 35 citations

Natural Sciences, Materials Engineering, Materials Science +17