Molecular Beam Epitaxy of Al Doped n-ZnSe

Toshiaki Takai, Jun Hyuk Chang, Kenji Godo, Takashi Hanada, T. Yao

physica status solidi (b) · 2002 · 14 citations · 9 references

Concepts

Abstract

Molecular beam epitaxy of Al doped n-type ZnSe is studied. Growth conditions such as Al cell temperature and substrate temperature are systematically examined. The electrical, optical and structural properties of ZnSe : Al layers are investigated. ZnSe : Al layers show high electron concentration of 8.37 × 1018 cm—3 with low electrical conductivity of 6.92 × 10—3 Ω cm along with high crystallinity.

References

9