Applied Physics Letters · 2001 · 93 citations · 22 references
Natural SciencesMaterials EngineeringMaterials ScienceElectronic MaterialsSemiconductor MaterialsSurface ScienceDislocation MechanicsDislocations In SemiconductorsEpitaxial GrowthMetal OxidesOxide SemiconductorsSemiconductor HeterostructuresBuffer LayersDislocation InteractionsEpitaxial Film GrowthHeteroepitaxyMismatchMolecular Beam EpitaxyMolecular Beam Epitaxy NucleationNucleation Mechanisms
We report on an experimental study of buffer mechanism in plasma-assisted molecular-beam epitaxy of ZnO on Al2O3(0001) with a MgO buffer. It lowers the surface energy and provides nucleation cores. As a result, lateral epitaxial growth of ZnO becomes favorable from the initial growth stage. The MgO buffer also affects the generation of dislocations in such a way that it reduces their density by introducing dislocation interactions. This study suggests that by employing an appropriate buffer to modify the initial nucleation environment, high quality heteroepitaxy is achievable even with large mismatch.
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Theory of Dislocations (2nd ed.)
J. P. Hirth, J. Lothe, T. Mura · Journal of Applied Mechanics · 1983 · 2K citations · Full text
Natural Sciences, Bioengineering, Biomedical Engineering +17
III–nitrides: Growth, characterization, and properties
S.C. Jain, M. Willander, J. Narayan et al. · Journal of Applied Physics · 2000 · 1.3K citations