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First cw operation of a Ga0.25In0.75As0.5P0.5-InP laser on a silicon substrate
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Citations
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References
1988
Year
Materials SciencePhotonicsGa0.25in0.75as0.5p0.5-inp LaserRoom TemperatureEngineeringAdvanced Laser ProcessingCw OperationOptical PropertiesRidge Structure LaserApplied PhysicsLaser ApplicationsLaser MaterialLaser Processing TechnologyPulsed Laser DepositionLaser-assisted DepositionSilicon SubstrateOptoelectronicsHigh-power Lasers
We report the first successful room-temperature cw operations of a Ga0.25 In0.75 As0.5 P0.5 -InP buried ridge structure laser emitting at 1.3 μm grown by two-step low-pressure metalorganic chemical vapor deposition on a silicon substrate. An output power of 20 mW with an external quantum efficiency of 16% at room temperature has been obtained. A threshold current as low as 45 mA under cw operation at room temperature has been measured. The first cw aging test at room temperature, at 2 mW during 5 h, shows a very low degradation (ΔI/I≤5%).
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