Japanese Journal of Applied Physics · 1977 · 55 citations · 1 references
Natural SciencesMaterials EngineeringMaterials ScienceElectronic MaterialsSemiconductor MaterialsThin FilmsDopingEpitaxial GrowthSemiconductor PhysicsSemiconductor SurfacesSemiconductor Thin FilmsThin Film Electrical PropertiesConductionDoping In Thin FilmsEpitaxial Film GrowthEpitaxial Thin-film GrowthHeteroepitaxyLattice MismatchMolecular Beam EpitaxySubstrate Temperature Effects
Thin crystalline films of InAs have been heteroepitaxially grown on (100) surface of GaAs by molecular beam epitaxy. The films are evaluated by optical microscope, SEM, RHEED and electrical measurements. In spite of the existence of a large lattice mismatch between InAs and GaAs, specular InAs films are obtained. Undoped InAs films show the n-type conduction, and their electron concentrations and mobilities are varied depending on the substrate temperature (Ts) during growth. At Ts=480°C, single crystalline films with high crystallographic quality and flat surfaces are grown. Furthermore, Mg atoms are successfully doped into InAs during the MBE growth to obtain p-type films.
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Molecular Beam Epitaxial Growth of InP
Yuichi Matsushima, Yuichi Hirofuji, Shun‐ichi Gonda et al. · Japanese Journal of Applied Physics · 1976 · 14 citations
Natural Sciences, Materials Engineering, Materials Science +17