IEEE Transactions on Nuclear Science · 1996 · 108 citations · 13 references
EngineeringElectrical EngineeringMicroelectronicsRadiation PhysicsSemiconductor DevicesAbsorbed DoseBipolar Junction TransistorsDevice ModelingHigh-dose Radiation EffectsMetal-oxide-semiconductor Field-effect TransistorsRadiation Damage In MaterialsBipolar Junction Transistor ModelingCurrent-voltage RelationsGainInterface TrapsMetal-oxide-semiconductor Field-effect Transistor ModelingRadiation EffectsSurface RecombinationTotal Dose
Ionizing-radiation-induced gain degradation in lateral PNP bipolar junction transistors is due to an increase in base current as a result of recombination at the surface of the device. A qualitative model is presented which identifies the physical mechanism responsible for excess base current. The increase in surface recombination velocity due to interface traps results in an increase in excess base current and the positive oxide charge moderates the increase in excess base current and changes the slope of the current-voltage characteristics. Analytical and empirical models have been developed to quantitatively describe the excess base current response to ionizing radiation. It is shown that the surface recombination velocity dominates the excess base current response to total dose.
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Response of advanced bipolar processes to ionizing radiation
E.W. Enlow, R.L. Pease, W.E. Combs et al. · IEEE Transactions on Nuclear Science · 1991 · 322 citations
Charge separation for bipolar transistors
S.L. Kosier, Ronald D. Schrimpf, R.N. Nowlin et al. · IEEE Transactions on Nuclear Science · 1993 · 200 citations