Publication | Closed Access
Interface properties of ultra-thin HfO2 films grown by atomic layer deposition on SiO2/Si
69
Citations
5
References
2003
Year
Materials ScienceEngineeringSurface ScienceApplied PhysicsUltra-thin Hfo2 FilmsThin FilmsSilicon On InsulatorEpitaxial GrowthChemical Vapor DepositionAtomic Layer DepositionThin Film ProcessingInterface Properties
| Year | Citations | |
|---|---|---|
Page 1
Page 1