Concepedia

Low dielectric constant CF/SiOF composite film deposition in a helicon plasma reactor

Seok‐Min Yun, Hong‐Young Chang, Min‐Sung Kang, Chi‐Kyu Choi

Thin Solid Films · 1999 · 21 citations · 11 references

DOI

Concepts

References

11

Plasma-structure dependence of the growth mechanism of plasma-polymerized fluorocarbon films with residual radicals

Munehiro Horie · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1995 · 57 citations

, , +16

Water Absorption Properties of Fluorine-Doped SiO<sub>2</sub> Films Using Plasma-Enhanced Chemical Vapor Deposition

Hideshi Miyajima, Ryota Katsumata, Yasushi Nakasaki et al. · Japanese Journal of Applied Physics · 1996 · 53 citations

, , +14

Observation of nonthermal electron tails in an rf excited argon magnetoplasma

Peiyuan Zhu, R. W. Boswell · Physics of Fluids B Plasma Physics · 1991 · 47 citations

, , +8

Study of the material properties and suitability of plasma-deposited fluorine-doped silicon dioxides for low dielectric constant interlevel dielectrics

V. L. Shannon, Marwa Karim · Thin Solid Films · 1995 · 40 citations

, , +16

Formation of SiOF Films by Plasma-Enhanced Chemical Vapor Deposition Using (C<sub>2</sub>H<sub>5</sub>O)<sub>3</sub>SiF

Hideyuki Kitoh Hideyuki Kitoh, Masakazu Muroyama, Masayoshi Sasaki et al. · Japanese Journal of Applied Physics · 1996 · 39 citations

, , +17