Masakazu Muroyama

Formation of SiOF Films by Plasma-Enhanced Chemical Vapor Deposition Using (C₂H₅O)₃SiF

Hideyuki Kitoh Hideyuki Kitoh, Masakazu Muroyama, Masayoshi Sasaki et al. · Japanese Journal of Applied Physics · 1996 · 39 citations

Natural Sciences, Materials Engineering, Materials Science +17

Gas-Phase Nucleation in an Atmospheric Pressure Chemical Vapor Deposition Process for SiO₂ Films Using Tetraethylorthosilicate (TEOS)

Motoaki Adachi, Kikuo Okuyama, Noboru Tohge et al. · Japanese Journal of Applied Physics · 1992 · 35 citations

Natural Sciences, Materials Engineering, Materials Science +13

Particle Generation and Film Formation in an Atmospheric-Pressure Chemical Vapor Deposition Reactor Using the Tetraethylorthosilicate (TEOS)/He, TEOS/O₂/He, and TEOS/O₃/He Systems

Motoaki Adachi, Kikuo Okuyama, Noboru Tohge et al. · Japanese Journal of Applied Physics · 1993 · 25 citations

Natural Sciences, Materials Engineering, Materials Science +13

Precursors in Atmospheric-Pressure Chemical Vapor Deposition of Silica Films from Tetraethylorthosilicate/Ozone System

Motoaki Adachi, Kikuo Okuyama, Noboru Tohge et al. · Japanese Journal of Applied Physics · 1994 · 15 citations

Natural Sciences, Chemistry, Materials Science +14

Chemical Vapor Deposition of Anti-Reflective Layer Film for Excimer Laser Lithography

Tetsuo Gocho, Tohru Ogawa, Masakazu Muroyama et al. · Japanese Journal of Applied Physics · 1994 · 14 citations

Natural Sciences, Materials Engineering, Materials Science +17