Hideshi Miyajima

Water Absorption Properties of Fluorine-Doped SiO₂ Films Using Plasma-Enhanced Chemical Vapor Deposition

Hideshi Miyajima, Ryota Katsumata, Yasushi Nakasaki et al. · Japanese Journal of Applied Physics · 1996 · 53 citations

Sio 2, Water Absorption Properties, Chemical Engineering +14

Properties of High-Performance Porous SiOC Low-k Film Fabricated Using Electron-Beam Curing

Takashi Yoda, K. Fujita, Hideshi Miyajima et al. · Japanese Journal of Applied Physics · 2005 · 26 citations

Materials Engineering, Materials Science, Electrical Engineering +15

Effect of Plasma Treatment and Dielectric Diffusion Barrier on Electromigration Performance of Copper Damascene Interconnects

Takamasa Usui, Hideshi Miyajima, Hideaki Masuda et al. · Japanese Journal of Applied Physics · 2006 · 25 citations

Engineering, Em Drift Velocity, Charge Transport +17

Review of methods for the mitigation of plasma‐induced damage to low‐dielectric‐constant interlayer dielectrics used for semiconductor logic device interconnects

Hideshi Miyajima, Kenji Ishikawa, Makoto Sekine et al. · Plasma Processes and Polymers · 2019 · 22 citations

Materials Science, Electrical Engineering, Plasma Electronics +14

Structural Studies of High-Performance Low-k Dielectric Materials Improved by Electron-Beam Curing

Takashi Yoda, Yasushi Nakasaki, Hideki Hashimoto et al. · Japanese Journal of Applied Physics · 2005 · 18 citations

Optical Materials, X-ray Spectroscopy, Engineering +22