Applied Physics Letters · 1999 · 131 citations · 5 references
Natural SciencesPhysicsPlasma PhysicsSpectroscopic AnalysisSpectroscopyAtomic Emission SpectroscopyEmission SpectroscopyHigh-temperature PlasmasPlasma DiagnosticsUltraviolet InstrumentationUltraviolet SpectroscopyCollisional BroadeningDensity MeasurementsH Alpha EmissionHydrogen Atom SpectrumLyman Alpha EmissionPlasma ProcessesUltraviolet Absorption LinesVacuum Ultraviolet Spectroscopy
We have developed a measurement technique for absolute H-atom densities in process plasmas using vacuum ultraviolet absorption spectroscopy employing a high-pressure microdischarge hollow-cathode lamp (MHCL) as a Lyman α (Lα, 121.6 nm) emission light source. Characterization of the Lα emission-line profile could be simplified by using a high-pressure discharge at about 1 atm. The effect of self-absorption in the MHCL was reduced to an insignificant level by decreasing the H2 partial pressure. The contribution of the collisional broadening to the Lα emission profile was estimated from the saturation characteristics of the absorption intensity when the optical thickness of the plasma was varied. The technique was applied to the measurement of the absolute H-atom density in an inductively coupled H2 plasma.
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Kôji Miyazaki, T. Kajiwara, Kenji Uchino et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1996 · 21 citations
Natural Sciences, Chemistry, Physics +15
Kôji Miyazaki, T. Kajiwara, Kenji Uchino et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1997 · 15 citations
Natural Sciences, Chemistry, Physics +15