Seigou Takashima

Behavior of atomic radicals and their effects on organic low dielectric constant film etching in high density N2/H2 and N2/NH3 plasmas

Hisao Nagai, Seigou Takashima, Mineo Hiramatsu et al. · Journal of Applied Physics · 2002 · 131 citations

Engineering, Organic Film, Chemistry +17

Vacuum ultraviolet absorption spectroscopy employing a microdiacharge hollow-cathode lamp for absolute density measurements of hydrogen atoms in reactive plasmas

Seigou Takashima, Masaru Hori, Toshio Goto et al. · Applied Physics Letters · 1999 · 131 citations

Ultraviolet Light, Engineering, Plasma Science +20

Measurement and control of absolute nitrogen atom density in an electron-beam-excited plasma using vacuum ultraviolet absorption spectroscopy

Shigekazu Tada, Seigou Takashima, Masafumi Ito et al. · Journal of Applied Physics · 2000 · 81 citations

Engineering, Laser-plasma Interaction, Plasma Science +16

Development of vacuum ultraviolet absorption spectroscopy technique employing nitrogen molecule microdischarge hollow cathode lamp for absolute density measurements of nitrogen atoms in process plasmas

Seigou Takashima, Shigeo Arai, Masaru Hori et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2001 · 70 citations

Engineering, Glow Discharge, Absorption Spectroscopy +17

Absolute concentration and loss kinetics of hydrogen atom in methane and hydrogen plasmas

Seigou Takashima, Masaru Hori, Toshio Goto et al. · Journal of Applied Physics · 2001 · 66 citations

Engineering, Physics, Atomic Emission Spectroscopy +15