Concepedia
Thin Solid Films · 2007 · 48 citations · 13 references
Materials ScienceThin Film PhysicsElectrical EngineeringEngineeringApplied PhysicsMo Thin-filmsThin Film DevicesThin Film Process TechnologyThin FilmsInterconnection MaterialsThermal StabilityChemical Vapor DepositionThin Film ProcessingInterconnect (Integrated Circuits)
13
Impact of floating gate dry etching on erase characteristics in NOR flash memory
W.H. Lee, Dongkyu Lee, Young-Ho Na et al. · IEEE Electron Device Letters · 2002 · 93 citations
Non-volatile Memory, Engineering, Nanoelectronics +17
Diffusion barrier properties of TaC between Si and Cu
Junji Imahori, Takeo Oku, Masanori Murakami · Thin Solid Films · 1997 · 64 citations
Diffusion Resistance, Physics, Applied Physics +3
The Cu-Mo (Copper-Molybdenum) system
P. R. Subramanian, David E. Laughlin · Bulletin of Alloy Phase Diagrams · 1990 · 63 citations
Materials Engineering, Materials Science, Engineering +4
Sputter-deposited Mo and reactively sputter-deposited Mo-N films as barrier layers against Cu diffusion
Jui‐Chang Chuang, Shuo‐Lun Tu, Mao‐Chieh Chen · Thin Solid Films · 1999 · 60 citations
Materials Science, Barrier Layers, Sputter-deposited Mo-n Films +9
Diffusion barrier performances of direct current sputter-deposited Mo and MoxN films between Cu and Si
Yue He, J.Y. Feng · Journal of Crystal Growth · 2003 · 37 citations
Materials Engineering, Materials Science, Diffusion Barrier Performances +7