2014 · 10 citations · 4 references
EngineeringElectrical EngineeringMaterials ScienceElectronic MaterialsSemiconductor DevicesSemiconductor MaterialsChemical Vapor DepositionLight-emitting DiodesMetal-oxide-semiconductor Field-effect TransistorsSemiconductor Device MaterialsThin-film MaterialsThin-film TransistorsAmorphous Indium Gallium Zinc OxideAmorphous Oxide SemiconductorsEncapsulationMetal-organic Chemical Vapor DepositionOrganic Light-emitting DiodesOrganic Thin-film TransistorsOxide Thin-film TransistorsThreshold Voltage
We reported large size amorphous Indium-Gallium-Zinc-Oxide and Indium-Tin-Zinc-Oxide thin film transistors active-matrix organic light-emitting diode television development history in AUO. The Gen6 threshold voltage uniformity can lower than 1.0V. Amorphous Indium-Tin-Zinc-Oxide thin film transistors show a higher mobility of 33.2 cm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> /VS. Amorphous 56 inches back channel etch type Indium-Tin-Zinc-Oxide active-matrix organic light-emitting diode television is 1st time revealed. Metal-organic chemical vapor deposition system is used to evaluate the new high mobility material. The side-by-side organic light-emitting diode device is realized by fine metal mask. The dam and fill encapsulation method shows a simple process procedure and highly stability. Ink jet printing is adopted to produce a small size full color panel. By the application of compensation pixel circuit, the panel drove by AUO engine shows an excellent characteristic.
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