IEEE Microwave Magazine · 2012 · 46 citations · 35 references
EngineeringElectrical EngineeringMicroelectronicsMicrowave EngineeringSemiconductor DevicesDevice CharacterizationDevice ModelingDevice ScalingHigh-frequency Semiconductor DevicesMetal-oxide-semiconductor Field-effect TransistorsRadio-frequency Integrated CircuitsActive Device CharacterizationActive Device ModelingCompact Device ModelingCompact ModelingDevice Scaling EffectsMetal-oxide-semiconductor Field-effect Transistor ModelingS-parameter CharacterizationSemiconductor Device Characterization
Due to the aggressive scaling of metal-oxide-semiconductor field-effect transistors (MOSFETs) and silicon germanium SiGe heterojunction bipolar transistors (HBTs), silicon-based circuits operating above 100 GHz are becoming a reality. However, at present, most, if not all semiconductor foundries extract their transistor and passive device models from measurements conducted below 110 GHz and often below 65 GHz. In order to reduce the number of design iterations, accurate S-parameter characterization techniques above 100 GHz are required for active and passive devices such that compact models may be developed and verified on representative circuits.
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Sorin P. Voinigescu, M.C. Maliepaard, J.L. Showell et al. · IEEE Journal of Solid-State Circuits · 1997 · 337 citations · Full text