Reactions of trimethylaluminum and ammonia on alumina at 600 K — surface chemical aspects of AlN thin film growth

Handbook of X-Ray Photoelectron Spectroscopy

J. F. Moulder · Medical Entomology and Zoology · 1995 · 23.7K citations

X-ray Spectroscopy, Engineering, Physics +6

Auger and photoelectron line energy relationships in aluminum–oxygen and silicon–oxygen compounds

C. D. Wagner, D. E. Passoja, H. F. Hillery et al. · Journal of Vacuum Science and Technology · 1982 · 823 citations

Engineering, Atomic Emission Spectroscopy, Oxidation Resistance +16

Inorganic infrared and raman spectra

S. S · Journal of Molecular Structure · 1973 · 480 citations

Raman Spectra, Inorganic Chemistry, Natural Sciences +5

The Use of Metalorganics in the Preparation of Semiconductor Materials

H. M. Manasevit, F. M. Erdmann, W. I. Simpson · Journal of The Electrochemical Society · 1971 · 296 citations

Materials Engineering, Materials Science, Engineering +5

Low Temperature Growth of GaN and AlN on GaAs Utilizing Metalorganics and Hydrazine

M. Mizuta, Shinji Fujieda, Yoshishige Matsumoto et al. · Japanese Journal of Applied Physics · 1986 · 243 citations

Materials Science, Aln Film, Electrical Engineering +11