Boron diffusion from a spin-on source during rapid thermal processing

Solid Solubilities of Impurity Elements in Germanium and Silicon*

F. A. Trumbore · Bell System Technical Journal · 1960 · 1.4K citations

Materials Science, Impurity Elements, Engineering +10

Formation of silicided, ultra-shallow junctions using low thermal budget processing

C. M. Osburn · Journal of Electronic Materials · 1990 · 73 citations

Materials Science, Wafer Scale Processing, Engineering +9

Challenges to manufacturing submicron, ultra-large scale integrated circuits

Richard B. Fair · Proceedings of the IEEE · 1990 · 60 citations

Downward Scaling, Engineering, Vlsi Design +19

Shallow-junction formation on silicon by rapid thermal diffusion of impurities from a spin-on source

Akira Usami, Masaya Ando, Masaki Tsunekane et al. · IEEE Transactions on Electron Devices · 1992 · 52 citations

Engineering, Optoelectronic Devices, Silicon On Insulator +24

Material and electrical properties of ultra-shallow p/sup +/-n junctions formed by low-energy ion implantation and rapid thermal annealing

Shin-Nam Hong, G. A. Ruggles, J. J. Wortman et al. · IEEE Transactions on Electron Devices · 1991 · 45 citations

Engineering, Electrical Properties, Semiconductor Device +18