Robust pixel-based source and mask optimization for inverse lithography

Improving resolution in photolithography with a phase-shifting mask

M. D. Levenson, R. A. Simpson · IEEE Transactions on Electron Devices · 1982 · 646 citations

Engineering, Electrical Engineering, Manufacturing Engineering +15

Mask Design for Optical Microlithography—An Inverse Imaging Problem

Amyn Poonawala, Peyman Milanfar · IEEE Transactions on Image Processing · 2007 · 216 citations

Engineering, Manufacturing Engineering, Biomedical Imaging +16

Fast pixel-based mask optimization for inverse lithography

Yuri Granik · Journal of Micro/Nanolithography MEMS and MOEMS · 2006 · 119 citations

Natural Sciences, Manufacturing Engineering, Mathematics +14

Pixel-based simultaneous source and mask optimization for resolution enhancement in optical lithography

Xu Ma, Gonzalo R. Arce · Optics Express · 2009 · 91 citations · Full text

Architecture, Manufacturing Engineering, Design Optimization +13

Pixelated source mask optimization for process robustness in optical lithography

Ningning Jia, Edmund Y. Lam · Optics Express · 2011 · 90 citations · Full text

Engineering, Manufacturing Engineering, Digital Imaging +15