Japanese Journal of Applied Physics · 1997 · 12 citations · 9 references
EngineeringMicroscopyOptoelectronic DevicesBeam LithographyMaterials FabricationAtomic Force MicroscopeNanolithographyNanometrologyAfm TipsNanolithography MethodMaterials ScienceSio 2NanotechnologyNanomanufacturingSurface NanoengineeringElectronic MaterialsMicrofabricationNanomaterialsSurface ScienceApplied PhysicsScanning Force MicroscopyNanofabricationThin Films
We report on the fabrication of a nanometer-scale SiO 2 mask on a semiconductor surface using an atomic force microscope (AFM). Layers of SiO 2 5–35 nm thick sputtered on GaAs substrates are covered with very thin polymethyl methacrylate (PMMA) films by spin-coating. The AFM tips were used mechanically to modify the polymer layers. Lines with 18-nm width and holes with 20-nm diameter were successfully patterned on the PMMA films. These patterns were transferred into the SiO 2 layers by wet etching in buffered HF. Linewidths as small as 40 nm have been obtained. Arrays of lines and holes with 200 nm periodicity were successfully fabricated.
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Fabrication of Si nanostructures with an atomic force microscope
E. S. Snow, P. M. Campbell · Applied Physics Letters · 1994 · 366 citations
Engineering, Afm Tip, Microscopy +20
Thermomechanical writing with an atomic force microscope tip
H. J. Mamin, D. Rugar · Applied Physics Letters · 1992 · 329 citations
Nanometer-scale lithography using the atomic force microscope
Arun Majumdar, P. I. Oden, J. P. Carrejo et al. · Applied Physics Letters · 1992 · 190 citations