Applied Physics Letters · 1988 · 51 citations · 7 references
EngineeringComputer EngineeringElectrical EngineeringMicroelectronicsSemiconductor DevicesVlsi DesignResonant CircuitsTunnelingVery-large-scale Integration LayoutCmos Logic CircuitsDifferential ResistanceDigital Logic CircuitsResonant TunnelingResonant Tunneling DevicesThree-dimensional IntegrationTunneling BarriersTunneling Diodes
We have developed structures with two well-defined negative differential resistance (NDR) regions by sequentially growing two resonant tunneling devices separated by an n+ connecting layer. Devices fabricated from these structures exhibited three stable operating points for multilevel logic circuits and were used in circuits which multiplied the input signal frequency by 3 or 5. This approach can be extended to obtain more than two NDR regions by vertical integration of additional resonant tunneling structures.
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S. Sen, Federico Capasso, A.Y. Cho et al. · IEEE Transactions on Electron Devices · 1987 · 151 citations
Tsuguo Inata, Shunichi Muto, Yoshiaki Nakata et al. · Japanese Journal of Applied Physics · 1987 · 108 citations