Two-color multi-wave lateral shearing interferometry for segmented wave-front measurements

Abstract

The possibility to measure segmented wave-front thanks to lateral shearing interferometry using diffraction grating is presented and analyzed. Aside from the response of such technique, the dynamic range is evaluated and shown to be limited. To greatly extend this one, a new method based on the use of two colors, not necessarily monochromatic, combined with an innovative Fourier treatment, is proposed. The two-color proposed in this paper is a high dynamic and low sensitivity technique; it can be completed by a one-color analysis, with low dynamics and high sensitivity, to reach high precision measurements. The ability of this method to measure Keck-like wave-front is demonstrated thanks to a computational analysis. Finally, a first experimental measurement of an etched substrate by using a quadri-wave lateral shearing interferometer is detailed.