The influence of carbon content in carbon-doped silicon oxide film by thermal treatment

Low dielectric constant polymers for microelectronics

G. Maier · Progress in Polymer Science · 2001 · 1.1K citations

Natural Sciences, Materials Engineering, Materials Science +12

Low Dielectric Constant Materials for ULSI Interconnects

Michael Morgen, E. Todd Ryan, Jie-Hua Zhao et al. · Annual Review of Materials Science · 2000 · 387 citations

Engineering, Electrical Engineering, Materials Engineering +17

Ultralow-k dielectrics prepared by plasma-enhanced chemical vapor deposition

A. Grill, V. Patel · Applied Physics Letters · 2001 · 232 citations

Natural Sciences, Materials Engineering, Materials Science +17

Spectroscopic evidence for valence-alternation-pair defect states in vitreous SiO₂

G. Lucovsky · Philosophical Magazine B · 1979 · 171 citations

Natural Sciences, Materials Science, Physics +17

Low dielectric constant materials and methods for interlayer dielectric films in ultralarge-scale integrated circuit multilevel interconnections

Tetsuya Homma · Materials Science and Engineering R Reports · 1998 · 110 citations

Natural Sciences, Electrical Engineering, Materials Science +16