Chemical vapor deposition of copper from 1,5-cyclooctadiene copper(I) hexafluoroacetylacetonate

Abstract

We have studied the chemical vapor deposition of copper from 1,5-cyclooctadiene Cu(I) hexafluoroacetylacetonate, a moderately volatile yellow cystalline solid. It yields pure copper by pyrolytic decomposition at 150–250 °C, produces copper films with near bulk resistivity, and has the advantage of being air stable at room temperature.