Concepedia

Comparison of the removal efficiency for organic contaminants on silicon wafers stored in plastic boxes between UV/O3 and ECR oxygen plasma cleaning methods

Kyunsuk Choi, Tae-Jong Eom, Chongmu Lee

Thin Solid Films · 2003 · 38 citations · 4 references

DOI

Concepts

References

4

Handbook of chemistry and physics

Journal of the Franklin Institute · 1930 · 11.7K citations

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Handbook of Chemistry and Physics.

Annals of Internal Medicine · 1973 · 2.6K citations

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In-situ low-temperature (600°C) wafer surface cleaning by electron cyclotron resonance hydrogen plasma for silicon homoepitaxial growth

Hyoun-Woo Kim, R. Reif · Thin Solid Films · 1996 · 27 citations

, , +17

Ion energy distribution in an ECR plasma chamber

Ren Zhao-xing · Vacuum · 1999 · 21 citations

, , +7