Direct Writing of Patterned Ceramics Using Electron‐Beam Lithography and Metallopolymer Resists

Abstract

Patterned arrays of ceramics have been fabricated using electron‐beam lithography (EBL) and a metallopolymer resist. Highly ordered arrays of dots, bars (see scanning electron microscopy and time‐of‐flight secondary ion mass spectrometry images in the Figure), and curved lines rich in Fe and Co are direct‐written on films of a highly metallized cobalt‐clusterized polyferrocenylsilane. Subsequent pyrolysis leads to ferromagnetic ceramics.