Concepedia

The chemical sputtering of silica by Ar+ ions and XeF2

M. A. Loudiana, A. W. Schmid, J. T. Dickinson, E. J. Ashley

Surface Science · 1984 · 28 citations · 15 references

DOI

Concepts

References

15

Thin Film Phenomena

K. L. Chopra, Julius Klerrer · Journal of The Electrochemical Society · 1970 · 2K citations

Ion- and electron-assisted gas-surface chemistry—An important effect in plasma etching

J. W. Coburn, Harold F. Winters · Journal of Applied Physics · 1979 · 738 citations

, , +17

The etching of silicon with XeF2 vapor

Harold F. Winters, J. W. Coburn · Applied Physics Letters · 1979 · 303 citations

, , +17

Chemical sputtering of fluorinated silicon

Yung-Yi Tu, T. J. Chuang, Harold F. Winters · Physical review. B, Condensed matter · 1981 · 226 citations

, , +17

Ion-enhanced gas-surface chemistry: The influence of the mass of the incident ion

U. Gerlach-Meyer, J. W. Coburn, E. Kay · Surface Science · 1981 · 149 citations

, , +12