Journal of Applied Physics · 1964 · 81 citations · 12 references
EngineeringChemistryMaterials ScienceElectronic MaterialsInorganic ChemistrySemiconductor MaterialsCarrier TransportDiffusion In SolidsDopingIii-v SemiconductorsSemiconductor InterfacesWide Band Gap SemiconductorsCarrier DiffusionCarrier Transport In SemiconductorsCharge States Of DefectsChemical DiffusionDiffusion In Semiconductor Thin FilmsDiffusion In SemiconductorsDiffusion MechanismsElectron Donors
Precise relationships between the diffusion coefficient D and the zinc concentration C are obtained from isoconcentration diffusion experiments performed at 900°C for zinc in GaAs and at 1000°C for zinc in GaP. It is found that D varies with C from a slightly less than cubic to a somewhat less than square dependence over the concentration range 1018 to 1020 cm−3. Possible mechanisms that result in concentration-dependent diffusion are discussed. Under the conditions given above, it is concluded that diffusion occurs by an interstitial-substitutional mechanism with the interstitial mode being dominant. The charge states of the various species involved in the diffusion are believed to be: (1) interstitial zinc atoms are doubly ionized donors; (2) substitutional zinc atoms are either neutral or singly ionized acceptors; and (3) gallium vacancies are neutral. A theoretical expression for D versus C, derived under these assumptions, fits the isoconcentration diffusion data over wide ranges of D and C through the use of only one adjustable parameter.
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Mechanism of Diffusion of Copper in Germanium
F. C. Frank, David Turnbull · Physical Review · 1956 · 579 citations
Rapid zinc diffusion in gallium arsenide
R. L. Longini · Solid-State Electronics · 1962 · 222 citations
Diffusion in Compound Semiconductors
B. Goldstein · Physical Review · 1961 · 219 citations