High performance GaAs MESFETs grown on InP substrates by MOCVD

Y. H. Lo, R. Bhat, T.P. Lee

Electronics Letters · 1988 · 24 citations · 2 references

Concepts

Abstract

1μm gate GaAs MESFETs with AlGaAs/GaAs buffer layers were grown on (100) InP substrates by low-pressure MOCVD. The linewidth of the X-ray rocking curve on this material is 315 arc seconds. Device transconductance of 220mS/mm and output conductance of l.2 mS/mm were achieved.

References

2