Applied Physics Letters · 1990 · 33 citations · 8 references
EngineeringElectrical EngineeringPhysicsMicrofabricationPlasma PhysicsRadiation PhysicsSoft LithographyX-ray ProductionPlasma X-ray SourcesX-ray Lithography
A novel soft x-ray source for submicron resolution lithography is described. Exploratory experiments with the x-pinch dense plasma radiation source have been performed using a 500 kA, 40 ns pulsed power generator. About 33 J of magnesium K-shell radiation (1.3–1.5 keV) and 10 J of aluminum K-shell radiation (1.6–1.7 keV) have been produced in a source approximately 0.5 mm or less in diameter during a single pulse. The yield increased rapidly with current, implying the possibility of exposing a resist at a distance of 40 cm using a<750 kA pulser in as few as ten pulses.
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