Characterization of hydrogenated amorphous silicon thin films prepared by magnetron sputtering

Structural interpretation of the vibrational spectra of<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mi>a</mml:mi></mml:math>-Si: H alloys

G. Lucovsky, R. J. Nemanich, J. C. Knights · Physical review. B, Condensed matter · 1979 · 805 citations

Engineering, Vibrational Modes, Chemistry +22

The hydrogen content of plasma-deposited silicon nitride

W. A. Lanford, Myron J. Rand · Journal of Applied Physics · 1978 · 780 citations

Semiconductors, Chemical Engineering, Engineering +10

Microstructure and properties of rf-sputtered amorphous hydrogenated silicon films

R. C. Ross, R. Messier · Journal of Applied Physics · 1981 · 114 citations

Materials Science, Surface Technology, Engineering +12

Discharge characteristics for magnetron sputtering of Al in Ar and Ar/O2 mixtures

S. Maniv, W. D. Westwood · Journal of Vacuum Science and Technology · 1980 · 114 citations

Materials Science, Materials Engineering, Electrical Engineering +15

Raman study of the network disorder in sputtered and glow discharge <i>a</i>-Si:H films

Gerardo Morell, Ram S. Katiyar, S. Z. Weisz et al. · Journal of Applied Physics · 1995 · 56 citations

Engineering, Radio Frequency, Thin Film Process Technology +16