Resolution limit of negative tone chemically amplified resist used for hybrid lithography: Influence of the molecular weight

Abstract

The objective of this article was to study the resolution limits of different negative tone chemically amplified resists from both commercial and experimental formulations. Process optimization has been done on all samples and this work underlines the importance of the choice of bake temperature to push resists to their ultimate resolution. Furthermore, the influence of several compounds, such as the polymer matrix blend, molecular weight, and photoacid compound, is detailed to determine the influence of each parameter on the final formulation performance.