Tantalum oxide capacitors for GaAs monolithic integrated circuits

M.E. Elta, A. Chu, L.J. Mahoney, R.T. Cerretani, W.E. Courtney

IEEE Electron Device Letters · 1982 · 21 citations · 3 references

Concepts

Abstract

The performance of a high-yield tantalum oxide capacitor for use in GaAs monolithic microwave integrated circuits is described. The integral metal-insulator-metal sandwich structure is reactively sputter-deposited at low temperatures, compatible with a photoresist lift-off process, on semi-insulating GaAs substrate. Dielectric constants of 20-25 were achieved in the capacitors fabricated. An initial application of this process as an interstage coupling capacitor for a two-stage preamplifier is given.

References

3