Concepedia

Description of arsenic and boron profiles implanted in SiO2, Si3N4 and Si using Pearson distributions with four moments

F. Jahnel, H. Ryssel, G. Prinke, Klaus H. Hoffmann, K. Müller, J.P. Biersack, R. Henkelmann

Nuclear Instruments and Methods · 1981 · 53 citations · 4 references

DOI

Concepts

References

4

The Advanced Theory of Statistics.

B. L. Welch, M. G. Kendall · Biometrika · 1945 · 1K citations

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Advanced theory of statistics.

Douglas G. Chapman · NCSU Libraries Repository (North Carolina State University Libraries) · 1959 · 425 citations

, , +11

Technique for determining concentration profiles of boron impurities in substrates

J. F. Ziegler, G.W. Cole, J. E. E. Baglin · Journal of Applied Physics · 1972 · 142 citations

, , +10

The determination of low dose boron implanted concentration profiles in silicon by the (n,α) reaction

K. Müller, R. Henkelmann, H. Boroffka · Nuclear Instruments and Methods · 1975 · 21 citations

, , +11