Lithographic patterning of self-assembled films

Abstract

This article discusses a new, general approach for fabricating surfaces with precise positional control of chemical functionalities utilizing direct patterning of self-assembled (SA) or- ganosilane monolayer films with lithographic exposure tools, including deep ultraviolet, x-ray, and e-beam sources. Lithographically patterned one- and two-component SA films have been used to selectively deposit or attach a wide variety of materials to surfaces, including catalysts, electroless metal films, proteins, cells, and organic moieties. Selectively metallized, patterned SA films have been employed to fabricate functioning Si metal–oxide–semiconductor field effect transistor test structures. The utility of patterned SA films for microelectronics, sensors, and other applications is discussed.