Writing implantation with a high current density focused ion beam

Temperature and energy dependence of ion-beam synthesis of epitaxial Si/CoSi2/Si heterostructures

Klaus Radermacher, S. Mantl, K. Kohlhof et al. · Journal of Applied Physics · 1990 · 45 citations

Engineering, Materials Engineering, Materials Science +17

Implantation profiles modified by sputtering

E. F. Krimmel, H.-J. Pfleiderer · Radiation Effects · 1973 · 32 citations

Engineering, Materials Engineering, Materials Science +9

Focused ion beam system with high current density

L. Bischoff, E. Hesse, D. Janssen et al. · Microelectronic Engineering · 1991 · 20 citations

Natural Sciences, Nuclear Engineering, Physics +8

High current FIB system for micromechanics application

L. Bischoff, E. Hesse, Gernot Hofmann et al. · Microelectronic Engineering · 1993 · 13 citations

Engineering, Manufacturing Engineering, Materials Science +7