Applied Physics Letters · 2000 · 169 citations · 11 references
Semiconductor TechnologyElectrical EngineeringEpitaxial GrowthEngineeringSubstrate-induced DefectsHigh Voltage EngineeringPower DeviceMorphological DefectsApplied PhysicsPower Semiconductor DeviceLow DensitySemiconductor Device FabricationMicroelectronicsSchottky DiodesScrew Dislocation DensityCarbideSemiconductor Device
Morphological defects and elementary screw dislocations in 4H–SiC were studied by high voltage Ni Schottky diodes. Micropipes were found to severely limit the performance of 4H–SiC power devices, whereas carrot-like defects did not influence the value of breakdown voltage. The screw dislocation density as determined by x-ray topography analysis under the active area of the diode was also found to directly affect the breakdown voltage. Only diodes with low density of screw dislocations and free from micropipes could block 2 kV or higher.
11
Ionization rates and critical fields in 4H silicon carbide
Andrey O. Konstantinov, Q. Wahab, N. Nordell et al. · Applied Physics Letters · 1997 · 397 citations
Electrical Engineering, Epitaxial P-n Diodes, Engineering +13
2.6 kV 4H-SiC lateral DMOSFETs
J. Spitz, M. R. Melloch, James A. Cooper et al. · IEEE Electron Device Letters · 1998 · 132 citations