Transition metal nitride thin films grown by MOCVD using amidinato based complexes [M(NtBu)2{(iPrN)2CMe}2] (M=Mo, W) as precursors

Nagendra Babu Srinivasan, Tobias Thiede, Teresa de los Arcos, Vanessa Gwildies, Michael Krasnopolski, Harry Becker, Detlef Rogalla, Anjana Devi, Roland A. Fischer

Surface and Coatings Technology · 2013 · 30 citations · 39 references

Concepts

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