Electrical properties of TiO2-based MIM capacitors deposited by TiCl4 and TTIP based atomic layer deposition processes - Concepedia

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Electrical properties of TiO2-based MIM capacitors deposited by TiCl4 and TTIP based atomic layer deposition processes

31

Citations

7

References

2011

Year

Boris Hudec, K. Hušeková, Aivar Tarre, Jeong Hwan Han, Sora Han, A. Rosová, Woongkyu Lee, Aarne Kasikov, Seul Ji Song, Jaan Aarik,

Microelectronic Engineering

Materials ScienceMaterials EngineeringElectrical EngineeringEngineeringTio2-based Mim CapacitorsElectrical Properties

References

	Year	Citations

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