Removal of scratch on the surface of MgO single crystal substrate in chemical mechanical polishing process

Application of Chemical Mechanical Polishing to the Fabrication of VLSI Circuit Interconnections

W. Patrick, W. L. Guthrie, C. L. Standley et al. · Journal of The Electrochemical Society · 1991 · 237 citations

Engineering, Electrical Engineering, Materials Science +17

Growth of YBa2Cu3O7 thin films on MgO: The effect of substrate preparation

B. H. Moeckly, Stephen E. Russek, D. K. Lathrop et al. · Applied Physics Letters · 1990 · 191 citations

Natural Sciences, Materials Engineering, Materials Science +16

Chemical mechanical polishing (CMP) anisotropy in sapphire

Honglin Zhu, Luiz A. Tessaroto, Robert Sabia et al. · Applied Surface Science · 2004 · 178 citations

Engineering, Materials Engineering, Materials Science +9

XPS and AFM investigations of annealing induced surface modifications of MgO single crystals

D. K. Aswal, K.P. Muthe, Shilpa Tawde et al. · Journal of Crystal Growth · 2002 · 138 citations

Natural Sciences, Materials Engineering, Materials Science +14

Effect of process parameters on material removal rate in chemical mechanical polishing of Si(100)

Markus Forsberg · Microelectronic Engineering · 2004 · 77 citations

Engineering, Materials Engineering, Materials Science +16