Optical and electrical properties of a-Si:H films grown by remote plasma enhanced chemical vapor deposition (RPECVD)

Structural interpretation of the vibrational spectra of<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mi>a</mml:mi></mml:math>-Si: H alloys

G. Lucovsky, R. J. Nemanich, J. C. Knights · Physical review. B, Condensed matter · 1979 · 810 citations

Natural Sciences, Materials Science, Physics +16

Characterized of glow-discharge deposited a-Si:H

H. Fritzsche · Solar Energy Materials · 1980 · 322 citations

Natural Sciences, Materials Science, Physics +5

Deposition of silicon dioxide and silicon nitride by remote plasma enhanced chemical vapor deposition

G. Lucovsky, P. D. Richard, D. V. Tsu et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1986 · 238 citations

Natural Sciences, Materials Engineering, Materials Science +17

‘‘Diamondlike’’ carbon films: Optical absorption, dielectric properties, and hardness dependence on deposition parameters

V. Natarajan, Joel D. Lamb, John A. Woollam et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1985 · 31 citations

Natural Sciences, Materials Science, Physics +17

Ar (3<i>P</i>2) induced chemical vapor deposition of hydrogenated amorphous silicon

Yasutake Toyoshima, Ken Kumata, Uichi Itoh et al. · Applied Physics Letters · 1985 · 29 citations

Natural Sciences, Materials Engineering, Materials Science +17