Preparation and properties of plasma-anodized silicon dioxide films

<i>Anodic Oxide Films</i>

L. Young, H. A. Liebhafsky · Physics Today · 1962 · 910 citations

A quasi-static technique for MOS C-V and surface state measurements

Markus Kühn · Solid-State Electronics · 1970 · 553 citations

Natural Sciences, Materials Science, Physics +13

Structural Evaluation of Silicon Oxide Films

W. A. Pliskin, H. Lehman · Journal of The Electrochemical Society · 1965 · 349 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +16

Silicon Oxidation in an Oxygen Plasma Excited by Microwaves

J. R. Ligenza · Journal of Applied Physics · 1965 · 141 citations

Natural Sciences, Materials Science, Physics +17

Low-Temperature Reduction of Fast Surface States Associated with Thermally Oxidized Silicon

P. L. Castro, B. E. Deal · Journal of The Electrochemical Society · 1971 · 103 citations

Engineering, Materials Engineering, Materials Science +17