<title>High-power KrF excimer laser with a solid state switch for microlithography</title> - Concepedia

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<title>High-power KrF excimer laser with a solid state switch for microlithography</title>

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1996

Year

Hakaru Mizoguchi, Noritoshi Ito, Hiroaki Nakarai, Yukio Kobayashi, Yasuo Itakura, Hiroshi Komori, Osamu Wakabayashi, Taketo Aruga, Takashi Sakugawa, Takehisa Koganezawa

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

EngineeringNew KrfHigh-power Laser TechnologyPower CircuitLaser ScienceLaser ApplicationsLaser PhysicsLaser MaterialSolid State SwitchHigh-power LasersLaser ControlLaser Micro-processingPulse PowerMicrolithography Kles-g7PhotonicsElectrical EngineeringPhysicsLaser Processing TechnologyLaser-assisted DepositionMicroelectronicsExcimer LasersAdvanced Laser ProcessingApplied PhysicsHigh-power KrfTechnologyOptoelectronics

Abstract

New KrF excimer laser for microlithography KLES-G7 with a new simple solid state pulsed power circuit (SPC) is developed. This SPC has several advantages such as less maintenance cost and the higher reliability. The laser realizes 7.5W with 0.8 bandwidth, 600 Hz, 10mJ. The performance and the stability of the laser is demonstrated. The maintenance interval of the SPC is more than 10 X 10<SUP>9</SUP> pulse. The KLES-G7 reduces 20 percent of the photon cost compared with the old model. It will accelerate the mass production of after 64Mbit DRAM.