Publication | Closed Access
The application of secondary effects in high aspect ratio dry etching for the fabrication of MEMS
29
Citations
8
References
2001
Year
Materials ScienceWafer Scale ProcessingEngineeringMicrofabricationFabrication TechniqueApplied PhysicsSecondary EffectsElectronic PackagingMicroelectronicsPlasma EtchingMicro-electromechanical System
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