Journal of Applied Physics · 2011 · 18 citations · 13 references
EngineeringElectrical EngineeringMaterials ScienceElectronic MaterialsSemiconductor DevicesSemiconductor MaterialsCurrent-voltage CharacteristicsMetal-oxide-semiconductor Field-effect TransistorsMetal-semiconductor ContactsOxide SemiconductorsSemiconductor InterfacesSurface PassivationContact ResistanceIn Situ Transmission Electron MicroscopyInterface-driven SwitchingOxide Memristive MaterialsOxygen VacanciesOxygen Vacancies In Metal OxidesResistive SwitchingSchottky Barrier Contacts
We report that the charged oxygen vacancies are the key element to induce a resistive switching in copper oxide resistive devices and an external bias drifts the charged vacancies at the metal/oxide Schottky interface causing the switching phenomenon by in situ transmission electron microscopy. Notable results are that the switching polarity is determined by the charge of the vacancies and that the voltage inducing non-volatile switching behavior originates from the Schottky barrier at the interface, which clarifies the origin of resistive switching and provides a design strategy for oxide resistive devices.
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Dmitri B. Strukov, Gregory S. Snider, Duncan R. Stewart et al. · Nature · 2008 · 11.5K citations
Engineering, Electrical Engineering, Electronic Materials +5
Resistive switching in transition metal oxides
Akihito Sawa · Materials Today · 2008 · 2.9K citations · Full text
Reproducible resistance switching in polycrystalline NiO films
Sunae Seo, Myoung‐Jae Lee, David H. Seo et al. · Applied Physics Letters · 2004 · 934 citations
Natural Sciences, Materials Engineering, Materials Science +16