Publication | Closed Access
High rate etching of SiC and SiCN in NF3 inductively coupled plasmas
27
Citations
17
References
1998
Year
Materials EngineeringElectrical EngineeringEngineeringNanoelectronicsApplied PhysicsHigh Rate EtchingGas Discharge PlasmaMicroelectronicsPlasma EtchingPlasma ProcessingPlasma Application
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