Defects and transport in complex oxide thin films

Abstract

Epitaxial oxide thin films are at the heart of new “oxide electronic” applications, such as excitonic ultraviolet light-emitting diodes and resistive switching memories. Complex oxide films are often grown by pulsed laser deposition (PLD) because the technique is believed to be material agnostic. Here, we show that one of the fundamental premises used to justify the use of PLD, that material is transferred from an ablation target to the film without stoichiometry deviations, is incorrect even when no volatile elements are involved. Even more importantly, the commonly used solution of increasing the laser energy density above a material-specific threshold value to obtain stoichiometric films cannot be used in the case of low carrier density systems such as SrTiO3, where even minute 1018 cm−3 order cation nonstoichiometry can have a dramatic effect on transport. Lattice parameter deviations in oxide films, which are often incorrectly ascribed to oxygen loss, correlate very well with cation nonstoichiometry. We show that proper simultaneous choice of ablation laser fluence and ablation area is essential and often more important than the growth temperature and oxygen pressure for obtaining bulklike properties in oxide heterostructures.