Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 30 citations · 0 references
Natural SciencesMaterials EngineeringMaterials ScienceMicrofabricationPolymer ChemistryPolymer MaterialsFabrication MaterialsSelf-assembled MaterialsSelf-assembled NanostructuresSoft LithographyThin Film LithographyThin-film PatterningBlock Copolymer Self-assemblyDirected Self-assemblyLithographic Surface PatterningSelf-assembling MaterialsSelf-assembling Polymers
We survey several different approaches wherein self-assembly has been applied in lithographic patterning. As part of this survey, we trace the evolution of block copolymer directed self-assembly used as lithographic technique, and summarize its current status. We compare a process based on block copolymer lithography with an equivalent process based on spacer pitch division. We conclude with a brief discussion of design issues and future research in the field.