Concepedia

ECR plasma etching of GaAs in CCl2F2/Ar/O2 discharge and IR studies of the etched surface

Lata Singh, K. P. Tiwary, Rahul Purohit, Zakiullah Zaidi, M. Husain

Current Applied Physics · 2004 · 14 citations · 15 references

Concepts

EngineeringElectrical EngineeringMaterials ScienceElectronic MaterialsSemiconductor DevicesSurface ScienceEtching ProcessesPlasma Surface TreatmentPlasma-surface InteractionsSemiconductor Device MaterialsThin Film EtchingWide-bandgap SemiconductorsEtch ChemistryEtch MechanismsEtch RateEtchingPlasma EtchingSurface Etching

References

15

Electron cyclotron resonance microwave discharges for etching and thin-film deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1989 · 361 citations

Engineering, Electrical Engineering, Physics +17

ELECTRON CYCLOTRON RESONANCE MICROWAVE DISCHARGES FOR ETCHING AND THIN?FILM DEPOSITION

V Asmussen · 1989 · 300 citations

Engineering, Electrical Engineering, Physics +12

Temperature Dependence of InP and GaAs Etching in a Chlorine Plasma

Vincent M. Donnelly, Daniel Flamm, Chengkun Tu et al. · Journal of The Electrochemical Society · 1982 · 122 citations

Natural Sciences, Materials Engineering, Materials Science +17

Reactive-ion etching of GaAs and InP using CCl2F2/Ar/O2

Evelyn L. Hu, Richard Howard · Applied Physics Letters · 1980 · 98 citations

Engineering, Materials Engineering, Materials Science +12

Plasma etching of III–V compound semiconductor materials and their oxides

G. Smolinsky, R. P. H. Chang, T. M. Mayer · Journal of Vacuum Science and Technology · 1981 · 71 citations

Engineering, Materials Engineering, Materials Science +15